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Anomalous C-V characteristics of implanted poly MOS structure in n/sup +//p/sup +/ dual-gate CMOS technology

✍ Scribed by Lu, C.-Y.; Sung, J.M.; Kirsch, H.C.; Hillenius, S.J.; Smith, T.E.; Manchanda, L.


Book ID
121268176
Publisher
IEEE
Year
1989
Tongue
English
Weight
254 KB
Volume
10
Category
Article
ISSN
0741-3106

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