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Annealing of total dose damage: redistribution of interface state density on [100], [110] and [111] orientation silicon

✍ Scribed by Stahlbush, R.E.; Lawrence, R.K.; Hughes, H.L.; Saks, N.S.


Book ID
114554578
Publisher
IEEE
Year
1988
Tongue
English
Weight
565 KB
Volume
35
Category
Article
ISSN
0018-9499

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