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Annealing behaviour and ranges of implanted ions in III–V and II–VI compound semiconductor materials

✍ Scribed by K. Väkeväinen; T. Ahlgren; E. Rauhala; J. Räisänen

Book ID: 114169673
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 350 KB
Volume: 136-138
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(97)00743-x

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