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Anisotropic scattering of conduction electrons on dilute Cu impurities in aluminum

โœ Scribed by C. Papastaikoudis; E. Thanou; D. Tsamakis; W. Tselfes


Publisher
Springer US
Year
1979
Tongue
English
Weight
378 KB
Volume
34
Category
Article
ISSN
0022-2291

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โœฆ Synopsis


The transverse magnetoresistivity AO/Oo and the low-fieM Hall coefficient Ro were measured in aluminum containing dilutely concentrated Cu impurities. It is found that the low-field Hall coefficient Ro is positive, in contrast to the isotropic value, which is negative. The large and positive values of Ro are due to the conduction electrons of aluminum that suffer an anisotropic scattering on the copper impurities. The simultaneous low-field magnetoresistance and Hall coefficient measurements, combined with the simple equations derived by Kesternich, permitted us to determine the anisotropy of the electronic scattering in terms of the mean free path ratios 1++/1_ and 1__/1_.


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