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Analysis of thin oxide films on silicon by back-scattering techniques : Ion Beam Analysis Group (Shanghai Institute of Metallurgy and Shanghai Institute of Nuclear Research). Int. J. Electron.46, (5) 513 (1979)


Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
50 KB
Volume
19
Category
Article
ISSN
0026-2714

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