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Analysis of the line pattern width and exposure efficiency in maskless lithography using a digital micromirror device

✍ Scribed by Hoonchul Ryoo; Dong Won Kang; Jae W. Hahn

Book ID: 113797873
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 875 KB
Volume: 88
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2011.06.016

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