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Analysis of the effects of reflectance and refraction generated by wafers made from fused silica, ALOxNy and TiSixNy under different light sources on pattern length and best focus

✍ Scribed by Yang-Kuao Kuo; Chuen-Guang Chao


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
382 KB
Volume
36
Category
Article
ISSN
0026-2692

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