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Analysis of the effects of mechanical stress on the properties of p-channel MOS structures. Part I. Choice of the theoretical model. The effect of stress on the valence band structure in silicon: Bogdan Moeschke. Electron Technol.12, (1) 29


Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
125 KB
Volume
20
Category
Article
ISSN
0026-2714

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