Analysis of the degradation and breakdown of thin SiO2 films under static and dynamic tests using a two-step stress procedure

✍ Scribed by Rodriguez, R.; Nafria, M.; Miranda, E.; Sune, J.; Aymerich, X.

• Book ID: 114538324
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 121 KB
• Volume: 47
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.877176