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Analysis of nitride storage non-volatile memories with HfSiOx blocking dielectric and TiN metal gate for low power embedded applications

✍ Scribed by Dušan S. Golubović; Michiel J. van Duuren; Nader Akil; Antonio Arreghini; Francesco Driussi


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
851 KB
Volume
86
Category
Article
ISSN
0167-9317

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