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Analysis of mechanical properties of N2 in situ doped polycrystalline 3C-SiC thin films by chemical vapor deposition using single-precursor hexamethyildisilane

✍ Scribed by Kang-San Kim; Ki-Bong Han; Gwiy-Sang Chung


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
282 KB
Volume
405
Category
Article
ISSN
0921-4526

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