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Analysis of helium and hydrogen effect on RAFS by means of multi-beam electron microscope

✍ Scribed by Hashimoto, N.; Tanimoto, J.; Kubota, T.; Kinoshita, H.; Ohnuki, S.


Book ID
118115997
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
480 KB
Volume
442
Category
Article
ISSN
0022-3115

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on