An overview of supercritical CO2 applications in microelectronics processing
β Scribed by Gina L Weibel; Christopher K Ober
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 215 KB
- Volume
- 65
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
β¦ Synopsis
Supercritical CO technologies have only recently been proposed for microelectronic applications in response 2 to needs for material-compatible cleaning systems, small-dimension developing solvents, and low chemical-use processes. Numerous proposed CO applications that are both process enabling and provide potential for 2 chemical abatement in microelectronics engineering are discussed to present readers with the current scope of research in the field. Examples include stripping of photoresist and residues, drying, developing, and spinning of resist, chemical fluid deposition of metals, silylation, and formation and patterning of low-dielectric materials.
π SIMILAR VOLUMES
Scheme 1. Room-temperature ionic liquids. Scheme 2. Metal-catalyzed organic reactions conducted in an ionic liquid and supercritical or compressed CO 2 .
Puerarin nanoparticles were firstly prepared in the process of solution-enhanced dispersion by supercritical CO 2 (SEDS) and then successfully microencapsulated by poly(L-lactide) (PLLA) in a modified SEDS process. By adding an organic non-solvent, an initial puerarin solution with a higher degree o