An optimal high contrast e-beam lithography process for the patterning of dense fin networks

✍ Scribed by F. Fruleux-Cornu; J. Penaud; E. Dubois; M. François; M. Muller

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 370 KB
• Volume: 26
• Category: Article
• ISSN: 0928-4931
• DOI: 10.1016/j.msec.2005.09.017