A model was created to assess occupational exposure to extremely low-frequency magnetic fields (ELF-MF) among semiconductor fabrication-room (fab) workers. This model was based on the assumption that each subject's exposure arose from being near identifiable ELF-MF sources or being in areas with hig
β¦ LIBER β¦
An Occupational Exposure Assessment for Engineered Nanoparticles Used in Semiconductor Fabrication
β Scribed by Shepard, M. N.; Brenner, S.
- Book ID
- 126900157
- Publisher
- Oxford University Press
- Year
- 2013
- Tongue
- English
- Weight
- 835 KB
- Volume
- 58
- Category
- Article
- ISSN
- 0003-4878
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