An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography

✍ Scribed by Mirkarimi, P.B.; Spiller, E.A.; Stearns, D.G.; Sperry, V.; Baker, S.L.

• Book ID: 117870000
• Publisher: IEEE
• Year: 2001
• Tongue: English
• Weight: 43 KB
• Volume: 37
• Category: Article
• ISSN: 0018-9197
• DOI: 10.1109/3.970896