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An investigation of films formed anodically on some metal silicon alloys

โœ Scribed by A.T. Kuhn; H. Shalaby

Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
568 KB
Volume
25
Category
Article
ISSN
0013-4686

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โœฆ Synopsis

Ahatract -Anodically formed surface films on Cu, Ni and Co alloyed with Si were investigated. X-ray and infrared spectroscopy were used to charactcrise the species formed at the surface. Talysurf and optical microscopy were used to measure the film thickness and the manner in which this varied with potential, time, alloy composition.

The films are found not to conform to normal rules of passivation, and an explanation for the manner in which this class of compound can operate as an anode is advanced invoking metal orthosilicatcs as elcctrccatalysts and conductors in the surface film.

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