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An investigation into the dependence of the chemically-etched edge profiles of silicon dioxide films on etchant concentration and temperature

✍ Scribed by R.A. Haken; I.M. Baker; J.D.E. Beynon


Book ID
107862008
Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
980 KB
Volume
18
Category
Article
ISSN
0040-6090

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