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An industrial SR-TXRF facility at ESRF

โœ Scribed by F Comin; P Mangiagalli; M Navizet; G Apostolo

Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
35 KB
Volume
45
Category
Article
ISSN
0167-9317

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โœฆ Synopsis

A TXRF industrial facility for the mapping of trace impurities on the surface of 300-mm Silicon wafers is presently in the construction phase and will start the commissioning phase at the end of 1998. The elements to be detected range from Na to 8 2

Hg with a target routine detection limit of 10 at / cm and the capability of mapping the surface of 300-mm wafer with a resolution of 500 pixels and a throughput of three wafers / h.

๐Ÿ“œ SIMILAR VOLUMES

Application of an injury surveillance sy
Application of an injury surveillance system to injuries at an industrial facility
โœ Clifford S. Mitchell; Marianne Cloeren; Brian S. Schwartz ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 667 KB

We developed a computerized surveillance database employing the Abbreviated Injury Scale (AIS) and sampled three months of nonfatal injuries at a large industrial facility. Data from 197 injury visits to the plant medical department were collected. With the addition of some new AIS codes for injurie