An in-situ monitor to measure the momentum flux during physical vapour deposition
โ Scribed by S. Mahieu; D. Depla
- Book ID
- 104094627
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 295 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0257-8972
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โฆ Synopsis
A tool to measure the momentum flux during physical vapour deposition has been developed. This tool basically consists of a torsion plate, i.e. a plate hooked up by a thin wire. Due to the impingement of particles, the torsion plate will rotate. Measuring this rotation allows the user to quantify the momentum flux towards the substrate during physical vapour deposition. The measurement of the momentum flux during reactive magnetron sputtering as a function of several deposition parameters, such as target-substrate distance, discharge current, pressure or reactive gas flow, is demonstrated in this paper. Also a relation with the mechanical properties is shown.
๐ SIMILAR VOLUMES
The design of an ultrahigh vacuum magnetron sputtering apparatus with facilities for in sttu Auger electron spectroscopy (AES) measurements and plasma diagnostics is presented. It consists of three chambers. The sample can be moved under ultrahigh vacuum conditions from the sputtering chamber throug