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An explanation for the low-temperature H evolution peak in hydrogenated amorphous silicon films deposited 'on the edge of crystallinity'

โœ Scribed by Mahan, A.H.; Beyer, W.; Williamson, D.L.; Yang, J.; Guha, S.


Book ID
126940679
Publisher
Taylor and Francis Group
Year
2000
Tongue
English
Weight
158 KB
Volume
80
Category
Article
ISSN
0950-0839

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