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An EXAFS investigation of arsenic shallow implant activation in silicon after laser sub-melt annealing

✍ Scribed by D. Giubertoni; G. Pepponi; M. Bersani; S. Gennaro; F. D’Acapito; R. Doherty; M.A. Foad


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
172 KB
Volume
253
Category
Article
ISSN
0168-583X

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