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An efficient wet-cleaning of SiGe virtual substrates and of thick, pure Ge layers on Si(0 0 1) after a chemical mechanical planarization step

✍ Scribed by A. Abbadie; J.M. Hartmann; C. Di Nardo; T. Billon; Y. Campidelli; P. Besson


Book ID
108207647
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
313 KB
Volume
83
Category
Article
ISSN
0167-9317

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