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An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate-co-methacrylic acid)

✍ Scribed by Kazuhiko Naitoh; Ken'ichi Koseki; Tsuguo Yamaoka


Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
724 KB
Volume
50
Category
Article
ISSN
0021-8995

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