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An Analytic Gradient-Based Inverse Lithography Approach for Partially-Coherent Double-Exposure Lithography

✍ Scribed by Xiong, Wei; Zhang, Jinyu; Tsai, Min-Chun; Wang, Yan; Yu, Zhiping


Book ID
111904037
Publisher
American Scientific Publishers
Year
2010
Tongue
English
Weight
786 KB
Volume
7
Category
Article
ISSN
1546-1955

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