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An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD

✍ Scribed by Michael T. Seman; David N. Richards; Pieter Rowlette; Colin A. Wolden


Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
470 KB
Volume
14
Category
Article
ISSN
0948-1907

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