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An accurate mobility model for the I–V characteristics of n-channel enhancement-mode MOSFETs with single-channel boron implantation

✍ Scribed by Ching-Yuan Wu; Yeong-Wen Daih


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
652 KB
Volume
28
Category
Article
ISSN
0038-1101

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