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An ab Initio/RRKM Study of Product Branching Ratios in the Photodissociation of Buta-1,2- and -1,3-dienes and But-2-yne at 193 nm

✍ Scribed by Hwa-Yu Lee; Vadim V. Kislov; Sheng-Hsien Lin; Alexander M. Mebel; Daniel M. Neumark


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
718 KB
Volume
9
Category
Article
ISSN
0947-6539

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