Amorphous silicon structure of heat-treated poly(n-propylsilyne) studied by far-infrared spectroscopy

✍ Scribed by A. Watanabe; Y. Nagai; M. Matsuda; M. Suezawa; K. Sumino

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 452 KB
• Volume: 207
• Category: Article
• ISSN: 0009-2614
• DOI: 10.1016/0009-2614(93)87003-l

✦ Synopsis

The formation of amorphous silicon using a silicon network polymer as a precursor was investigated. Poly (n-propylsilyne), which has a silicon network structure, was heat-treated in vacua. The organic side group of poly(n-propylsilyne) disappeared completely and the optical band gap EL@ decreased from 2.91 to 1.29 eV by heat-treatment at 400°C. The heat-treated poly(npropytsilyne) showed a far-infrared absorption spectrum similar to amorphous silicon.