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Amorphisation during elevated temperature implantation

โœ Scribed by G Carter; MJ Nobes; RG Elliman


Book ID
103468275
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
987 KB
Volume
45
Category
Article
ISSN
0042-207X

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The model of effective heat of formation in metal-Al binary system proposed by Pretorius et al. was developed based on characteristics of the solid-state reaction at interface to predict the formation of intermetallics during metal ion implantation into Al substrate at elevated temperature. For the