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Aluminum oxide for an effective gate in Si/SiGe two-dimensional electron gas systems

✍ Scribed by Shin, Yun-Sok; Brunner, Roland; Shibatomi, Akihiro; Obata, Toshiaki; Otsuka, Tomohiro; Yoneda, Jun; Shiraki, Yasuhiro; Sawano, Kentarou; Tokura, Yasuhiro; Harada, Yuichi; Ishibashi, Koji; Tarucha, Seigo

Book ID: 125535886
Publisher: Institute of Physics
Year: 2011
Tongue: English
Weight: 292 KB
Volume: 26
Category: Article
ISSN: 0268-1242
DOI: 10.1088/0268-1242/26/5/055004

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