Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy technology

✍ Scribed by V. N. Bessolov; Yu. V. Zhilyaev; E. V. Konenkova; L. M. Sorokin; N. A. Feoktistov; Sh. Sharofidinov; M. P. Shcheglov; S. A. Kukushkin; L. I. Mets; A. V. Osipov

• Book ID: 111450719
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2010
• Tongue: English
• Weight: 373 KB
• Volume: 36
• Category: Article
• ISSN: 1063-7850
• DOI: 10.1134/s1063785010060039