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Alterations of wheat root plasma membrane lipid composition induced by copper stress result in changed physicochemical properties of plasma membrane lipid vesicles

✍ Scribed by Anna H Berglund; Mike F Quartacci; Lucia Calucci; Flavia Navari-Izzo; Calogero Pinzino; Conny Liljenberg


Book ID
117048060
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
154 KB
Volume
1564
Category
Article
ISSN
0005-2736

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