✦ LIBER ✦
Allowable Substrate Bias for the Etching of n-GaN in Photo-Enhanced Electrochemical Etching
✍ Scribed by Seo, J.W. ;Oh, C.S. ;Yang, J.W. ;Yang, G.M. ;Lim, K.Y. ;Yoon, C.J. ;Lee, H.J.
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 91 KB
- Volume
- 188
- Category
- Article
- ISSN
- 0031-8965
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