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AlGaN/GaN Heterostructure Field-Effect Transistors with High Al Compositions Fabricated with Selective-Area Regrowth

✍ Scribed by Maeda, N. ;Saitoh, T. ;Tusubaki, K. ;Kobayashi, N.


Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
77 KB
Volume
188
Category
Article
ISSN
0031-8965

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