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Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

โœ Scribed by Seong Keun Kim; Gyu-Jin Choi; Sang Young Lee; Minha Seo; Sang Woon Lee; Jeong Hwan Han; Hyo-Shin Ahn; Seungwu Han; Cheol Seong Hwang


Book ID
101417177
Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
360 KB
Volume
20
Category
Article
ISSN
0935-9648

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