Advances in contamination control of processing chemicals in VLSI : E. M. Juleff, W. J. McLeod, E. A. Hulse and S. Fawcett. Solid St. Technol., 82 (September 1982)

Advances in contamination control of pro

Advances in contamination control of processing chemicals in VLSI: E. M. Juleff, W. J. McLeod, E. A. Hulse and S. Fawcett Solid St. Technol., 82 (September 1982)

📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 94 KB

continued from page 6 t tent results allowing one to describe the variation of the carrier scattering mechanisms across the film and to determine the exact profiles for carrier mobilities and concentration as well as for the anisotrop coefficient.