Advanced nanopattern formation by a subtractive self-organization process with focused ion beams

✍ Scribed by A. Lugstein; B. Basner; W. Brezna; M. Weil; S. Golka; E. Bertagnolli

• Book ID: 103860675
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 308 KB
• Volume: 242
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.08.004

✦ Synopsis

We have studied the evolution of the GaAs, InAs and GaSb surfaces due to FIB exposure. In contrast to conventional bottom up or top down processes the observed nanopattern formation is discussed, based on a subtractive self-organization process relying on material decomposition induced by FIB exposure.