✦ LIBER ✦
Advanced electron-beam lithography for 0.5 μm to 0.25 μm device fabrication : F. J. Hohn, A. D. Wilson and P. Coane. IBM J. Res. Devl. 32, 514 (1988)
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 122 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0026-2714
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