β Scribed by Michelle J.S Spencer; Graeme L Nyberg
No coin nor oath required. For personal study only.
The adsorption of methylsilane on the (1 1 1), (1 1 0) and polycrystalline surfaces of copper is examined using vibrational electron energy loss spectroscopy, angle-resolved ultraviolet photoelectron spectroscopy and X-ray photoelectron spectroscopy. On all surfaces, low exposures of methylsilane below )140 Β°C yield chemisorbed CH 3 Si species, while undissociated methylsilane physisorbs at higher exposures. This physisorbed layer then dissociates at higher temperatures to leave CH 3 Si on the surface by room temperature. Above room temperature, the VEELS and ARUP spectra suggest that Si-C bond cleavage occurs on the (1 1 1) surface, whereas the C-H bonds break to leave an SiC molecular species on the (1 1 0) surface. A surface-molecule bonding model is constructed to describe the adsorbatesubstrate interactions and suggests that CH 3 Si adsorbs in a hollow site on the (1 1 1) surface and in a long-bridge site on the (1 1 0) surface.
π SIMILAR VOLUMES
A simple quantum chemical theory of dissociative adsorption is introduced and applied to the chcmisorption of hydrogen on copper. Hydrogen is predicted to chcmisorb more readily on the stepped (311) surface than on either of its component low index fa;ILcs.
In this paper, we conducted potentiometric titrations, batch adsorption experiments and FT-IR analysis to study the uptake of copper in illite/water suspensions and then applied the constant capacitance surface complexation model to interpret the reaction mechanism at the aqueous illite surfaces. Ou