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Adsorption of Cationic Surfactants onto Photoresist Surfaces—A Way to Reduce Pattern Collapse in High Aspect Ratio Patterning

✍ Scribed by A. Drechsler; N. Petong; C. Bellmann; A. Synytska; P. Busch; M. Stamm; K. Grundke; O. Wunnicke


Book ID
102095683
Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
254 KB
Volume
84
Category
Article
ISSN
0008-4034

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