[ACM Press the 43rd annual conference -
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Chen, Huang-Yu; Chiang, Mei-Fang; Chang, Yao-Wen; Chen, Lumdo; Han, Brian
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Article
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2006
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ACM Press
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As the technology node advances into the nanometer era, via-open defects are one of the dominant failures. To improve via yield and reliability, redundant-via insertion is a highly recommended technique proposed by foundries. Traditionally, double-via insertion is performed at the post-layout stage.