We have grown nitrogen-doped ZnO (ZnO:N) films by laser molecular-beam epitaxy. The use of lattice-matched ScAlMgO 4 substrates prevented the degradation of crystallinity induced by the nitrogen incorporation to the films. Despite this improvement, we have not obtained ZnO:N films which showed p-typ
Acceptor state formation in arsenic-doped ZnO films grown using ozone
✍ Scribed by Erie, J. M. ;Ivill, M. ;Kim, H. S. ;Pearton, S. J. ;Gila, B. ;Ren, F. ;Norton, D. P.
- Publisher
- John Wiley and Sons
- Year
- 2008
- Tongue
- English
- Weight
- 271 KB
- Volume
- 205
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
The optical and transport properties of As‐doped ZnO films are examined. The films are grown by pulsed‐laser deposition using As~2~O~3~ as the source of As and O~3~/O~2~ as the oxidant. The films are epitaxial, single phase, and oriented in the ZnO [002] direction. Low temperature photoluminescence spectra at 20 K show for the formation of acceptor states associated with the As, although Hall measurements indicate that the films doped with 0.2 at% As are n‐type. From the photoluminescence spectra, the binding energy of the As‐related acceptor was estimated to be 155 meV. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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