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Absolute rate constants for F + CH3CHO and CH3CO + O2, relative rate study of CH3CO + NO, and the product distribution of the F + CH3CHO reaction

โœ Scribed by Jens Sehested; Lene K. Christensen; Ole J. Nielsen; Timothy J. Wallington


Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
204 KB
Volume
30
Category
Article
ISSN
0538-8066

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โœฆ Synopsis


Using a pulse-radiolysis transient UV-VIS absorption system, rate constants for the reactions of F atoms with CH 3 CHO (1) and CH 3 CO radicals with O 2 (2) and NO (3) at 295 K and 1000 mbar total pressure of SF 6 was determined to be

By monitoring the for-ฯช12 ฯช11 3 ฯช1 ฯช1 (4.4 ฯฎ 0.7) ฯซ 10 , and k ฯญ (2.4 ฯฎ 0.7) ฯซ 10 cm molecule s . 3 mation of CH 3 C(O)O 2 radicals ( ฯพ 250nm) and NO 2 ( ฯญ 400.5nm) following radiolysis of SF 6 /CH 3 CHO/O 2 and SF 6 /CH 3 CHO/O 2 /NO mixtures, respectively, it was deduced that reaction of F atoms with CH 3 CHO gives (65 ฯฎ 9)% CH 3 CO and (35 ฯฎ 9)% HC(O)CH 2 radicals. Finally, the data obtained here suggest that decomposition of HC(O)CH 2 O radicals via C9C bond scission occurs at a rate of


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