A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact

Design of photoresists with reduced envi

Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)

✍ J. M. Havard; M. Yoshida; D. Pasini; N. Vladimirov; J. M. J. Frechet; D. R. Mede 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 353 KB 👁 1 views

The performance of water-and solvent-cast, two-component photoresist films containing poly(2-isopropenyl-2-oxazoline) or poly(2-isopropenyl-2-oxazoline-costyrene) with a photoacid generator has been investigated. These materials afford negative-tone images after deep-UV exposure and development in a