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A unified approach to resists materials design for the advanced lithographic technologies

✍ Scribed by O. Nalamasu; E. Reichmanis; A.G. Timko; R. Tarascon; A.E. Novembre; S. Slater; H. Holzwarth; P. Falcigno; N. Mu¨nzel

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
548 KB
Volume
27
Category
Article
ISSN
0167-9317

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