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A unified approach to profiling the lateral distributions of both oxide charge and interface states in n-MOSFET's under various bias stress conditions

✍ Scribed by Shui-Ming Cheng; Cherng-Ming Yih; Jun-Chyi Yeh; Song-Nian Kuo; Chung, S.S.


Book ID
114537033
Publisher
IEEE
Year
1997
Tongue
English
Weight
238 KB
Volume
44
Category
Article
ISSN
0018-9383

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