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A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

✍ Scribed by Kushner, Mark J.; Collison, Wenli Z.; Grapperhaus, Michael J.; Holland, John P.; Barnes, Michael S.


Book ID
121331795
Publisher
American Institute of Physics
Year
1996
Tongue
English
Weight
473 KB
Volume
80
Category
Article
ISSN
0021-8979

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