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A theoretical interpretation of the electrical behaviour of individual edge dislocations in Si as determined by combined EBIC/TEM studies

✍ Scribed by Dr. A. Ourmazd


Publisher
John Wiley and Sons
Year
1981
Tongue
English
Weight
493 KB
Volume
16
Category
Article
ISSN
0232-1300

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✦ Synopsis


Abstract

The EBIC data obtained from individual edge and Frank partial dislocations ^i^n Si, and described in other publications, are related to defect parameters, such as the capture cross‐section for minority carriers, which determine electrical recombination properties of dislocations. A two stage model for the capture of minority carriers by dislocations is developed and shown to correctly account for the temperature‐dependence of the EBIC contrast obtained from these dislocations.