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A systematic study of the surface roughening and sputter rate variations occurring during SIMS ultrashallow depth profile analysis of Si with Cs+

✍ Scribed by P.A.W. van der Heide; M.S. Lim; S.S. Perry; J. Bennett


Book ID
114166369
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
347 KB
Volume
201
Category
Article
ISSN
0168-583X

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